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Chemical supply system and C&C process
Real-time monitoring of the concentration of each chemical is conducted in a central supply system or individual wet cleaning equipment.
Chemical Concentration Monitor
SemiChem APM Series
Measures up to four components, including H2O2, H2SO4, and HF ppm concentrations in the sample.
Utilizes the titration method and shows excellent accuracy and reproducibility.
Standard monitoring is possible, and it can be measured in all on/off-line environments.
Measures H2O2, H2SO4, and HF at a concentration of 150/300 ppm in DHF and DBS chemicals, using UV/IR Optical Absorption Spectroscopy