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Gas
Etch, Diffusion, CVD processes and scrubber
Analyzes the activity and component of gas inside the chamber before and after the process.
Mass
Aston impact
Analyzes components with a mass of 300 amu or less in gas samples.
Despite its compact and lightweight design, demonstrates a high level of sensitivity through its high-performance mass filter.
Aston plasma
Analyzes components with a mass of 300 amu or less in gas samples. Both EI and Plasma modes of ionization can be used.
Improved lifetime through self-cleaning.
Psi
Compensates through auto-validation for the inevitable data drift that occurs according to the lifespan of parts.
Ensure stable reproducibility of data by regularly measuring it using a different STD gas inside.